中村　圭二　NAKAMURA Keiji

プロフィール

職名	教授
所属	工学部 電気電子システム工学科 工学部 電気システム工学科 大学院 工学研究科 電気電子工学専攻 工学部 電子情報工学科
最終学歴	名古屋大学大学院工学研究科
学位	工学博士（名古屋大学）
所属学会・役職	電気学会 応用物理学会 プラズマ・核融合学会 IEEE
専門分野	プラズマ工学、計測工学
研究テーマ	高密度プラズマの生成・計測・制御、プラズマを用いた材料プロセス、環境保全に向けたプラズマ応用
授業科目	放電現象特論A （大学院）、電気数学演習B、電子回路A、電気応用工学実験A、ゼミナールB
公開連絡先	メールアドレス：nakamura ＠ solan.chubu.ac.jp

学術論文、評論

'Electron Density Range Measurable by Microwave Resonator Probe with Higher Mode Resonance'; Y. Liang, K. Kato, , K. Nakamura and H. Sugai; Japanese Journal of Applied Physics Vol. 50 (2011) , pp. 116101-1- 116101-6

'Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive Plasmas'; I. Liang, K. Nakamura and H. Sugai; Appl. Phys. Express Vol. 4 (2011) , p. 066101-1

'Observation of Optical Fluorescence of GaN Thin Films in an Inductively-Coupled Plasma Containing High Energy Electrons'; Y. Guo, K. Nakamura and , J. Zhang, Y. Nakano and H. Sugai; Japanese Journal of Applied Physics Vol. 50 (2011) , p. 01AA02-1

'Simulation of Resistive Microwave Resonantor Probe for High Pressure Plasma Diagnostics'; J. Xu, K. Nakamura, , Q. Zhang and H. Sugai; Plasma Sources Science and Technology Vol. 18 (2009) , p. 45009

'Application of Droplet-Free Metal Ion Source to Formation of Gas Barrier Thin Films'; K. Nakamura; Physica Status Solidi c Vol. 5 (2008) , No. 4, pp. 887- 892

'Droplet-Free High-Density Metal Ion Source for Plasma Immersion Ion Implantation'; K. Nakamura, H. Yoshinaga and K. Yukimura; Nuclear Instruments and Methods in Physics research B Vol. 242 (2006) , pp. 315- 317

'Ar/O2 Gas Pressure Dependence of Atomic Concentration of Zirconia Prepared by Ziconium Pulse Arc PBII&D'; K. Yukimura, H. Yoshinaga and , Y. Ohtsu, H. Fujita, K. Nakamura and X. Ma; Nuclear Instruments and Methods in Physics research B Vol. 242 (2006) , pp. 318- 320

'Significant Enhancement of Ion-Induced Secondary Electron Current by Photons in Plasma Immersion Ion Implantation'; K. Nakamura and H. Sugai; Surf. Coat. Technol. Vol. 196 (2005) , No. 1-3, pp. 184- 187

講演、シンポジウム、学会発表

'Curling Probe Monitoring of Plasma CVD and Wall Cleaning Processes'; A. PANDEY, K. KATO. , S. IKEZAWA, K. NAKAMURA and H. SUGAI; 5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) (January 2013, Japan) Tup-A07OA

'In-itu photo luminescence observation of GaN thin film exposed in inductively-coupled plasmas'; M. Chen, K. Nakamura, Y. Nakano and H. Sugai; 5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) (January 2013, Japan) P1030A

'Effects of configuration on resonance characteristics of plane-type microwave resonator probe'; E. Kumazaki, K. Nakamura and H. Sugai; 5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) (January 2013, Japan) P1024.

'In-situ Photoluminescence Measurements of GaN Films Exposed to Inductively-Coupled Plasmas'; K. NAKAMURA, M. CHEN, Y. NAKANO and H. SUGAI; 34th Int. Symp. Dry Process (DPS2012) (November 2012, Japan) P-64

'Monitoring of electron density and wall deposit by curling probe during plasma process'; A. Pandey, M. Imai, H. Kanematsu, S. Ikezawa, K. Nakamura and H. Sugai ; 34th Int. Symp. Dry Process (DPS2012) (November 2012, Japan) E-4

'In Situ Monitoring of Electron Density and Dielectric Layer on the Wall with Curling Probe'; A. PANDEY, Y. LIANG. , S. IKEZAWA, K. NAKAMURA and H. SUGAI; AVS 59th International Symposium and Exhibition (October 2012, U. S. A.) PS1-WeA3

'Novel diagnostic tool, curling probe, for monitoring electron density during plasma processing'; A. PANDEY, Y. LIANG. , S. IKEZAWA, K. NAKAMURA and H. SUGAI; 65th Annual Gaseous Electronics Conference (GEC) (October 2012, U. S. A.) DT1.00004

' In-situ Monitoring of Surface Modification of GaN Films Exposed to Inductively-

Coupled Plasmas'; K. NAKAMURA, M. CHEN, Y. NAKANO and H. SUGAI; 65th Annual Gaseous Electronics Conference (GEC) (October 2012, U. S. A.) NW1.00072

'In-situ photoluminescence monitoring of GaN in plasma exposure'; M. Chen, K. Nakamura. , Y. Nakano, S. Yu and H. Sugai; 4th Int. Conf. Microelectronics & Plasma Technology (ICMAP2012) (July 2012, Korea) S021　2012-372, p. 505

'Miniaturization of Plane-Type Microwave Resonator Probe with Multi-Resonant Frequencies'; K. Nakamura, H. Kumazaki and N. Sugai; 5th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2012) (March 2012, Japan) P-01

社会活動

プラズマ・核融合学会広報委

応用物理学会東海支部幹事

IEEE Nagoya Section Standing Committee Chairs

電気学会　高密度・高電離度メタルプラズマの発生と利用に関する調査専門委員会　委員